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| Waste Gas Abatement
System |
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Tomoe Shokai' s dry
scrubber MAK series converts toxic components of exhaust
gases to safe compounds by means of a reaction between
the TOM-CLEAN chemical processing agent and the toxic components.
The system is compatible with numerous types of exhaust
gases as the appropriate TOM-CLEAN chemical processing
agent can be selected for the target gas. |
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Wide-Ranging
Compatibility |
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The wide line-up of chemical processing
agents allows the user to select the optimum processing
agent for the target gas. Also, upon the userfs request,
Tomoe Shokai' s Yokohama Research Center can perform on-site
analysis exhaust gas and design the processing agent according
to the results of the analysis. |
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Low Pressure
Loss |
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The system uses a processing agent charging
method with little pressure loss. Running costs are reduced
and special exhaust blowers are unnecessary by keeping
pressure loss within the system to 0.1 KPa. |
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Improved Controllability |
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The timing of replacement of the agent can
be controlled accurately because the sampling position
of the break monitor is switched automatically. |
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Safety |
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For the unit that comes into contact
with exhaust gases, the most suitable materials
are selected in consideration of the gases
to be processed and the reaction temperature. |
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In addition to the break monitor,
pressure within the system and temperature
of the processing agent are also constantly
monitored, and an alarm is issued in the event
of an abnormality. (Optional) |
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Solid products mixed in the gases
can be removed by the bug filter. |
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The exhaust gas processing line
uses a full-bore type valve, and is designed
such that blocking in the system is prevented. |
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After reacting with the target
gases, the processing agent is a stable compound
that can be processed safely by Tomoe Shokai
as industrial waste. |
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Types of Gases
that Can Be Processed |
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| Processing agent |
Target process |
Target
gas |
| TC-I |
Ion-Implantation |
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AsH3, PH3,
BF3 |
| TC-II |
CVD(Thermal) |
Si-N, Ti-N |
NH3, TiCl4 |
| TC-IV |
CVD |
Si-N, W-Si, Si-O-F |
SiH2Cl2, WF6,
SiF4, HCl, HF, F2 |
| Etching |
Metal, Poly-Si, Si-O |
BCl3, HCl, HBr, F2,
SiF4, WF6 |
| Chamber Cleaning |
HF, F2, SiF4, COF2,
OF2 |
| TC-V |
CVD(Thermal) |
Si-O |
TEOS, CO |
| TC-XI |
Etching |
Metal |
Cl2, BCl3, HBr |
| TC-XII |
CVD |
Si-O, Si-N, Poly-Si |
SiH4, PH3,
AsH3, B2H6 |
| D-Poly SiOF, MO |
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Note: In addition to the above, special charging using ClF3 is
available for chamber cleaning. |
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Exhaust Gas
Processing Data (FT-IR Analysis) |
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Specifications |
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1-Cylinder
Type |
2-Cylinder
Type |
| NAK-040E |
MAK-100E |
MAK-550E |
MAK-040 |
MAK-100 |
MAK-550 |
| External Dimensions (mm) |
650 x
650 x 1800 |
750 x
750 x 1800 |
950 x
950 x 1800 |
1200 x
650 x 1800 |
1400 x
750 x 1800 |
2200 x
950 x 1800 |
| Weight (kg) |
300 |
350 |
500 |
450 |
550 |
800 |
| Processing Cylinder Dimensions
(mm) |
267.4 x
900 |
355.6 x
900 |
575.0 x
900 |
267.4 x
900 |
355.6 x900 |
575.0 x
900 |
| Max. Gas Flow (L/min.) |
60 |
120 |
250 |
60 |
120 |
250 |
| Processed Gas Concentration
(%) |
<3 |
<3 |
<2 |
<3 |
<3 |
<2 |
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Utilities |
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| Item |
Specifications |
| Casing Material |
SPCC |
| Pipe Materials |
SUS304 |
| Power Source |
AC 100 V, 50/60 Hz, 3.0 A |
| Case Exhaust Outlet |
ø100 Short Pipe |
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Exhaust Gas
Analysis (Optional) |
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| Using high-precision gas analyzers (FT-IR
etc.), Tomoe Shokai researchers perform on-site analysis
not only of MAK exhaust but also of process exhaust
as required, |
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