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From an environmental viewpoint, the
RID-ACE chamber cleaning unit from Tomoe Shokai is
an indispensable product. It prevents the corrosion
of equipment and avoids the exposure of workers to
poisonous gases, such as HCL, HF, and CL2, which
may be emitted during cleaning of the processing
chambers of semiconductor manufacturing equipment.
RID-ACE completely neutralizes corrosive gasses that
pollute the clean room environment during chamber maintenance. |
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Effects |
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Avoids the exposure of workers to harmful
gases (Safety measure) |
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Prevents corrosion due to spread of
harmful gases (Equipment maintenance) |
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Reduces purge time, due to forced exhaust
(Improved operational availability) |
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Applicable to multiple units (space
saving and lower operating costs). |
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Test Data |
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Suction flow |
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Suction of 1.1 m3/min. |
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Application field |
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Aluminum etchers |
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Measuring method |
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Tape-type toxic gas monitor
(using FP-250)
For HCL, 0 to 1,000 ppb |
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Measurement results |
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100 ppb max. |
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Design conditions |
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Target gases |
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Acid gas, BCl3,
Cl2, HCl, COCl2, SiCl4,
HF, SiF4, COF2, F2,
HBr, Br2, SiBr4, and SF6 decomposition
products |
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Exhaust flow |
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1.1m3/min |
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Concentration of
target gases |
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Less than 500 ppm |
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Concentration of exit gases |
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Less than TLV value |
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Replacement of processing
agent |
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Every 300 hours (of blower
operation) |
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Method of Use |
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Connect the chamber and
RID-ACE using a vacuum coupling (NW-40), and the
gas is removed from the chamber by suction using
the blower in the main unit. |
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Toxic gases are rendered
harmless by reaction and material absorption by the
deodorizer. |
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Fine dust particles are
removed by the HEPA filter. |
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Exhaust from this unit
is returned to the clean room, or discharged from
a exhaust duct. |
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After the processing, cleaning
of the chamber will reduce noxious odors. |
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External Dimensions |
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Utilities |
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Main unit power source |
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AC 100 V, 15 A |
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Couplers |
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Suction: NW-40
Exhaust: NW-40 |
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